Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...
Documents 1986.0463.14, 1983.0463.15, and 1983.0463.16 are stored in a three-ring binder that is marked on the front cover: MITS “Creative Electronics” ALTAIR DOCUMENTATION. The notebook is signed on ...
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