Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features Nanoimprint ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

China has quietly mandated that at least 50% of equipment used for new semiconductor capacity be domestically sourced.

Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...

E-beam lithography operates on principles similar to photolithography but provides significantly higher resolution. The process begins with coating a substrate with an electron-sensitive resist ...

TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...

IBM has joined other tech giants to help develop a new chipmaking technology that will allow production of computer processors many times more powerful than current models. The company announced ...

The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...