TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...

The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...

A distinguished expert in AI-driven computational lithography and advanced metrology, Botlagunta Preethish Nandan has recently come up with a new approach to elevate the precision and efficiency of ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

Nanoimprint lithography (NIL) is an advanced nanofabrication technique capable of creating patterns and structures smaller than 10 nm with low cost, high throughput ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

In the autumn, I had the opportunity to attend the 2024 SPIE Photomask Technology and EUV Lithography conferences, collectively referred to as PUV or sometimes BACUS, the latter a reference to the ...