Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...

Scanning probe lithography (SPL) represents a rapidly evolving class of nanofabrication techniques that utilise the precision of scanning probe microscopy to directly manipulate material surfaces at ...

Belgian research center IMEC today announced it has extended its lithography industrial affiliation program (IIAP) through 2003, using ASML’s PAS5500/1100 high NA 193nm step-and-scan system, ...

KLA-Tencor Corp. and ASML today jointly announced the introduction of analysis software that will let chipmakers automatically transfer overlay test data from KLA's 5000 series overlay metrology tools ...

A disclosure on China's government procurement platform shows that Shanghai Micro Electronics Equipment (SMEE) has won a contract to supply a step-and-scan lithography system valued at CNY109 million ...

(Nanowerk Spotlight) Conventional optical lithography is the standard and most common technique in the semiconductor industry and in the microfabrication research field. Although several approaches ...