ASML Developing Next-Gen EUV Lithography
ieee.org
ASML Developing Next-Gen EUV Lithography
Productivity gains will continue through the next two or three chip generations, but after that we’ll need something bigger and better
Dec 5, 2018
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ASML EUV lithography machines fire 50,000 molten tin droplets per second in a vacuum; while hitting each droplet twice with a laser to generate EUV light. This requires mirrors polished so precisely… | Andrew Geyer
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Dive into an EUV system - Reticle | ASML | 14 comments
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What’s the reticle in a lithography system? Find out in this clip. Check out all our EUV systems, and the technology behind them: http://ms.spr.ly/6182wLVGO | ASML
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